TEL Technology Center, Albany, NYSemiconductor wafer manufacturing involves a number of processes, ranging in size from nanometers to meters. This, along with coupling the physics of chemical...
This tutorial model investigates the effects of various parameters on the electron energy distribution function and rate coefficients for an argon discharge.
This model simulates electrical breakdown in an atmospheric pressure gas. Because electrical breakdown is a complicated process, a 1D model is considered. To highlight the physics of the breakdown process, the model uses a simple argon...
This model investigates the electrical characteristics of the GEC reference cell for argon chemistry.
This model of a high density inductively coupled plasma at 1 torr computes the neutral gas temperature and flow field as well as all the other components which make up the plasma. Gas heating occurs due to quenching of excited Argon atoms.
This model investigates 3D effects for an inductively coupled plasma. Asymmetry in the pressure field leads to non-uniform fluxes to the wafer surface.
This model uses an analytic port to send a plane wave into a reactor containing low pressure Argon. The wave is partially absorbed and reflected by the plasma which sustains the plasma.